Radiofrequency Microneedling

Focus Dual is a new treatment for achieving skin tightening, lifting, firming and contouring. Focus Dual uses a combination of radiofrequency and microneedling technology to create a controlled trauma which triggers the body’s healing response of collagen and elastin production. Both technologies used in this treatment stimulate collagen in different ways. Microneedling creates micro-traumas in the skin, thereby stimulating the healing response, while radiofrequency uses heat to tighten the skin from the inside out. With Focus Dual you receive two treatments in one, meaning that you will achieve a stronger treatment and more effective results than when compared to having microneedling and radiofrequency treatments individually. The result is firmer, tighter, smoother, more lifted and hydrated skin.

What does Radiofrequency Microneedling treat?

Wrinkles and fine lines
Acne and surgical scars
Crepey neck skin
Loose and sagging skin
Stretch mark reduction
Uneven skin tone and texture
Pigmentation
Large pores
Loss of facial volume

FREQUENTLY ASKED QUESTIONS

How does Radiofrequency (RF) Microneedling work?

Ultrafine needles penetrate the skin to different depths whilst simultaneously releasing radiofrequency (RF) energy to heat the skin in a controlled manner, stimulating a wound healing response leading to the production of new collagen and elastin.
Our patients love how natural their skin looks and the results get better and better over time.

Can Radiofrequency Microneedling (RFM) be used on patients of all ages?

Yes, younger skin that doesn’t yet require lifting and tightening can benefit from Microneedling without the RF, where the focus is now more on refining pores, evening out texture and improving overall quality.
Older patients with laxity concerns benefit from the dual effect of the Microneedling with Radiofrequency. As the Focus Dual offers many different needle depths and intensity settings for RF, treatments can be easily customised for every different skin and level of concern.